Advancing Lithography Science, Technology, and Workforce for India's Semiconductor Ecosystem. Bridging commercial fabs, equipment OEMs, EDA pioneers, and academic research.
Lithography is one of the most critical and complex processes in semiconductor manufacturing. It transfers circuit patterns from photomask designs onto silicon wafers, directly setting the limits for critical dimension (CD), overlay accuracy, and chip performance.
As India establishes its commercial semiconductor manufacturing ecosystem, there is an urgent need for a unified national platform where experts across fabs, equipment OEMs, materials suppliers, EDA vendors, and academic labs can share research, align technical roadmaps, and cultivate specialized workforce talent.
Directly establishes critical dimensions and defect-free printable feature boundaries.
Aligning dozens of patterned layers with nanometer accuracy to maximize fab yield.
GPU-accelerated OPC, inverse lithography, and resist modeling driving yield economics.
Designed to bring together India's growing semiconductor fab ecosystem, academic talent, and international leaders.
Gain insights into scalable lithography roadmaps—from DUV immersion and High-NA EUV to computational lithography, curvilinear masks, and AI-driven advanced process control (APC).
Engage directly with leaders from semiconductor fabs, equipment OEMs, materials suppliers, EDA companies, research labs, and government policymaking bodies in one focused national forum.
Advance research and career trajectories through interactive student poster sessions, guided tours of IIT Gandhinagar nanofabrication cleanrooms, and roundtables with fab practitioners.
InLitho 2027 is structured around four primary pillars spanning foundational physics to advanced fab manufacturing.
Imaging optics, advanced photoresists, overlay metrology, defectivity, exposure/development, and process-window optimization.
193nm immersion, self-aligned multiple patterning (SADP/SAQP), EUV, High-NA EUV, and alternative nanoscale patterning.
Optical Proximity Correction (OPC), Source-Mask Optimization (SMO), Inverse Lithography (ILT), GPU acceleration & digital twins.
Inspection metrology, advanced process control (APC), defect-yield modeling, Design-Technology Co-Optimization and sustainability.
India is experiencing historic momentum in commercial semiconductor fabrication and packaging. With mega-fabs and advanced packaging facilities established across Gujarat, InLitho 2027 at IIT Gandhinagar creates the dedicated talent and process bridge for critical lithography workflows.
Speaker announcements, workshop registration rates, and student poster submissions will open soon. Register your interest today to receive early delegate notifications.